简介:在柔性LCP基板上制备RFMEMS开关,加工难度较大,影响开关质量的因素较多。主要研究影响LCP基RFMEMS开关加工质量的主要因素,寻找工艺过程控制解决方案。通过对关键工序的试验,对加工过程中的基板清洗、LCP基板覆铜面镀涂及整平、LCP基板无铜面溅射金属膜层、LCP基板平整度保持、二氧化硅膜层生长及图形化、牺牲层加工、薄膜微桥加工、牺牲层释放等工序进行了参数优化。研制的LCP基RFMEMS开关样件频率≤20GHz、插入损耗≤0.5dB,回波损耗≤-20dB,隔离度≥20dB,驱动电压30~50V。该加工方法对柔性基板上可动结构的制造具有一定的借鉴价值。
简介:<正>00585UltraBroadbandMEMSSwitchonSiliconandGaAsSubstrates/R.Chan,R.Lesnick,D.Caruthetal(UniversityofIllinois,USA)//GaAsMANTECHConference.2003.—25报导了高可靠dc~110GHz低压毫米波GaAs与Si衬底MEMS开关的性能。当频率高至110GHz,该开关插损小于6dB,隔离度大于15dB,开关寿命大于6.9×10~9循环。文章还介绍了实现超宽带性能及高可靠性所采用的设计方法和制造方法。
简介:AreviewontheresearchofMicroElectromechanicalSystems(MEMS)technologybasedbiomimeticciliaispresented.Biomimeticcilia,enabledbytheadvancementofMEMStechnology,havebeenunderdynamicdevelopmentforthepastdecade.AfterabriefdescriptionofthebackgroundofciliaandMEMStechnology,differentbiomimeticciliaapplicationsarereviewed.Biomimeticciliamicro-actuators,includingmicromachinedpolyimidebimorphbiomimeticciliamicro-actuator,electro-staticallyactuatedpolymerbiomimeticciliamicro-actuator,andmagneticallyactuatednanorodarraybiomimeticciliamicro-actuator,arepresented.Subsequentlymicromachinedunderwaterflowbiomimeticciliamicro-sensorisstudied,followedbyacousticflowmicro-sensor.ThefabricationoftheseMEMS-basedbiomimeticciliadevices,characterizationoftheirphysicalproperties,andtheresultsoftheirapplicationexperimentsarediscussed.
简介:MicroandNanotechnologyareengineeringonanextremelysmallscale.Alreadytheyarebeingappliedtocreatemanynewproducts.Nanotechnologyispredictedtobecomethebasisforremarkablypowerfulandinexpensivecomputers,fundamentallynewmedicaltechnologiesthatcouldsavemillionsoflives,sensorsimportantinmilitaryapplicationaswellasenvironmentalprotection.Themainaimofthisreviewistoconcentrateinformationfromdifferentprintedandonlinesourcesandhelptomakearightdecisioninverydynamicsensormarketaswellasletknowwhatweshouldexpectinthenearestfuture.
简介:PolysiliconMicroelectromechanicalsystems(MEMS)arethesubjectofintensiveresearches.SurfacechemistryandtopographyofaMEMSteststructurefabricatedatSandiaNationalLaboratory,USA,werestudiedbymeansofscanningelectronmicroscopy(SEM),X-rayphotoelectronspectroscopy(XPS)andatomicforcemicroscopy(AFM).XPSC()andSi2,spectrafromthepolysilieoncomponents,siliconnitridesubstrateandareferencesiliconwaferwerecompared.Theresultsconfirmthepresenceofaself-assembledmonolayer(SAM)ontheMEMSsurface.Anisland-likemorphologywasfoundonbothpolysiliconandsiliconnitridesurfacesoftheMEMS.Theislandstaketheformofcaps,beingupto0.5μmindiameterand20nminheight.Itisconcludedthattheco-existenceofcolumnargrowthandequiaxedgrowthduringthelowpressurechemicalvapordeposition(LPCVD)oftheselayersleadstotheobservedmorphologyandtheislandsarecapstothecolumnarstructures.