摘要
PolysiliconMicroelectromechanicalsystems(MEMS)arethesubjectofintensiveresearches.SurfacechemistryandtopographyofaMEMSteststructurefabricatedatSandiaNationalLaboratory,USA,werestudiedbymeansofscanningelectronmicroscopy(SEM),X-rayphotoelectronspectroscopy(XPS)andatomicforcemicroscopy(AFM).XPSC()andSi2,spectrafromthepolysilieoncomponents,siliconnitridesubstrateandareferencesiliconwaferwerecompared.Theresultsconfirmthepresenceofaself-assembledmonolayer(SAM)ontheMEMSsurface.Anisland-likemorphologywasfoundonbothpolysiliconandsiliconnitridesurfacesoftheMEMS.Theislandstaketheformofcaps,beingupto0.5μmindiameterand20nminheight.Itisconcludedthattheco-existenceofcolumnargrowthandequiaxedgrowthduringthelowpressurechemicalvapordeposition(LPCVD)oftheselayersleadstotheobservedmorphologyandtheislandsarecapstothecolumnarstructures.
出版日期
2004年04月14日（中国期刊网平台首次上网日期，不代表论文的发表时间）
