简介:Nano-ZrO2wasusedtopreparecompositeelectroplatingbathbyaddingdifferentkindsofdispersantssuchasPEGandMZS.Thecompositeelectroplatingbathwasstudiedbymeansofsedimentationexperimentsandparticle-sizeanalysis.Theresultsshowedthatdispersantswithsimplestructureandsmallmolecularweightcouldnotplaystericrole,however,thehighlydispersedandstabilizednanoparticleNi-ZrO2compositeelectroplatingbathwasobtainedatpHvalueequalingto3byaddingMZSwhichisakindofmacromoleculedispersantwithplentifulbranchedchains.
简介:介绍一种金属/合金的生产方法,用于恒电流和恒电位条件下由混合硫化物(Cu2S,NiS)生产Cu-Ni合金,称为直接电化学还原(DER)。研究槽电压和槽电流等工艺参数对还原得到的化合物组成的影响,以生产工业所需的CuNi10,CuNi20和CuNi30等合金。在1200°C下采用循环伏安法(CV)考察Cu2S和NiS在CaCl2熔体中的电化学行为。根据CV研究结果,Cu2S的阴极还原是一步完成的,即Cu2S?Cu;NiS的阴极还原则分两步进行,即NiS?Ni3S2?Ni。恒电流研究表明,在10A电流下电解15min,可制备出最高硫含量为320×10-6的高纯CuNi10合金。扫描电子显微镜以及能量色散X射线能谱和光学发射光谱(OES)测试结果表明,在2.5V电压下直接电化学还原15min,可制备出杂质含量低(即硫含量小于60×10-6)的所选成分的Cu-Ni合金。
简介:Thecorrosionbehaviorandanti-corrosionmechanismoftheZn-Ni-Al2O3compositecoatingwereinvestigatedbySEM,EDSandXPS.TheresultsindicatethatthecorrosiontypeoftheZn-Ni-Al2O3coatingsinneutral5wt.%NaClsolutionisuniformcorrosion.ThepresenceofcompactanduniformlydispersednanoaluminaparticlessubstantiallyinhibitsthecorrosionofZn-Ni-Al2O3compositecoatings.Intheinitialcorrosionstage,thecorrosiveproductsofZn-NimatrixformacompactZnCl2·4Zn(OH)2layer.Withthedevelopmentofcorrosion,somenanoaluminaparticlesareembeddedandformaNienrichmentlayer.InNienrichmentlayer,NipresentsasNiandNiO.
简介:NanocrystallineMg2Ni-typealloyswithnominalcompositionsofMg20Ni10–xCux(x=0,1,2,3,4,massfraction,%)weresynthesizedbyrapidquenchingtechnique.Themicrostructuresoftheas-castandquenchedalloyswerecharacterizedbyXRD,SEMandHRTEM.Theelectrochemicalhydrogenstorageperformancesweretestedbyanautomaticgalvanostaticsystem.ThehydridinganddehydridingkineticsofthealloysweremeasuredusinganautomaticallycontrolledSievertsapparatus.Theresultsshowthatalltheas-quenchedalloysholdthetypicalnanocrystallinestructureandtherapidquenchingdoesnotchangethemajorphaseMg2Ni.Therapidquenchingsignificantlyimprovestheelectrochemicalhydrogenstoragecapacityofthealloys,whereasitslightlyimpairsthecyclingstabilityofthealloys.Additionally,thehydrogenabsorptionanddesorptioncapacitiesofthealloyssignificantlyincreasewithrisingquenchingrate.
简介:Basedonclustervariationmethod(CVM)andnaturaliterationmethod(NIM),order-disorderphasetransitionintheintercalationcompoundsM1/2TiS2issimulatedbycomputer.Thefavorableconditions,underwhich3a0×a0superstructureisformed,aregiven,andtheresultsareingoodagreementwiththeexperimentsandtheoreticalcalculations.TherelationshipbetweencriticaltemperatureandM-ion-vacancyinteractionparameterislinear.
简介:激光冲击强化是一种新型表面处理技术,利用高功率激光束冲击金属零件表面,在零件表面形成较大的残余压应力,可有效改善零件的疲劳性能。以发动机1Cr11Ni2W2MoV叶片为研究对象,对其进行了激光冲击强化处理,研究强化处理对材料的微观组织和疲劳性能的影响。研究结果表明:相比未处理试样,激光冲击强化在1Cr11Ni2W2MoV叶片材料表层形成较大的残余压应力,表层晶粒更为细化,叶片的疲劳寿命提高1.7倍。
简介:1IntroductionThenickelaloysandcomplexesarewidelyusedasmagnetic,optical,nuclearandsuperconductingmaterials[1,2].Manynickelcom...
简介:1IntroductionNorfloxacinbelongstothecompoundoftheseriesofcarbostyrilcontainingfluorine.Itisabroadspectrumantimicrobial,and...
简介:通过化学沉积法制备Ni-P、Ni-Mo-P单镀层以及与其成分相同的Ni-P/Ni-Mo-P双镀层。采用纳米压痕法和AFM分析测量镀层表面和截面的残余应力,并用电化学法评估镀层在10%HCl溶液中的腐蚀行为,以获得镀层残余应力与腐蚀行为之间的关系。结果表明:Ni-P单镀层和Ni-P/Ni-Mo-P双镀层表现为残余压应力,分别为241和206MPa;Ni-Mo-P单镀层呈现出257MPa的残余拉应力。残余压应力阻止镀层中孔洞的生长,保护镀层的完整性。Ni-P/Ni-Mo-P双镀层比它们的单镀层具有更好的耐蚀性。此外,镀层的应力状态影响其腐蚀形式。
简介:LayeredcathodematerialLiCo1/3Ni1/3Mn1/3O2wassynthesizedbyPechiniprocess,andinvestigatedusingX-raydiffraction(XRD),scanningelectronmicroscopy(SEM)andgalvanostaticcharge/dischargecycling.Thesampleiswell-crystallizedandhasaphase-purea-NaFeO2structure.Theparticlesizesareuniform,anddistributedintherangeof20-200nm.TheinitialdischargecapacityoftheLi/LiCo1/3Ni1/3Mn1/3O2cellwasabout149mAh·g-1whenitwascycledatavoltagerangeof4.5-2.3Vwithaspecificcurrentof0.25mA.Theresultisbetterincomparisonwithsolid-statesolutionmethod.Thesyntheticprocedurewasdiscussed.Threemajorreactions:chelation,esterification,andpolymerizationsuccessivelyoccurred.
简介:NanocrystallineNi粉末成功地被制作由机械地在有1个wt.%Y_2O_3粒子的低温实验法的温度(cryomilling)的milling。试验性的结果证明了Ni谷物尺寸面对Y_2O_3粒子在cryomilling的2h以后被归结为25nm。cryomilledNi/Y_2O_3粉末能维持他们的nanocrystalline结构直到900℃,否则融化中的62%个Ni指。有约100nm的athermally稳定的谷物尺寸的体积nanocrystallineNi/Y_2O_3材料被cryomilling生产,冷均衡说的紧迫,由热均衡说的压列在后面。体积nanocrystallineNi/lwt.%Y_2O_3的微坚硬是315DPH,它二倍高于常规Ni的。
简介:ToseparatethecadmiumandnickelresourcesinwasteNi-Cdbatteries,aself-designedvacuumdistillationrecyclingsystemwasstudiedunderlaboratoryconditions.Theeffectsofsystemtemperature,operatingpressure,andtimeontheseparationofNiandCdwerestudiedrespectively.Themechanismofvacuumthermalrecyclingwasalsodiscussed.ResultsshowthatvacuumdistillationisaveryeffectiveseparationmethodforwasteNi-Cdbatteries.AtaConstantpressure,theincreaseoftemperaturecanimprovetheseparatingefficiencyofCd.Whenthetemperatureis1173K,Cadmiumcanevaporatecompletelyfromthesamplesduring3hat10Pa,ThereductionofpressureinacertainrangeiseffectivetotheseparatingofCdfromNi-Cdbatteriesbyvacuumdistillation.
简介:ToreducetheproductioncostofBi-2223superconductingtapes,Bi-2223/Ag/Nitapeswerefabricatedbythepowder-in-tubeprocess.TheeffectofheattreatmentonthemicrostructureandcriticalcurrentoftheBi-2223/Ag/Nitapeswerestudied.ThephasecompositionsofthesampleswerecharacterizedusingXRD.ThemicrostructurewasobservedusingSEM.ExperimentalresultsindicatethathighertemperatureismoreconducivetotheformationofBi-2223phaseatanatmosphereof8.5%O2.Afterthetwo-steph...
简介:Flexiblethin-filmsupercapacitorswithhighspecificcapacitancearehighlydesirableformodernwearableormicro-sizedelectricalandelectronicapplications.Inthiscontribution,Ni-Cohydroxides(NCH)nanosheetsweredepositedontopofNi-Cualloy(NCA)nanowirearraysformingafreestandingthin-filmcompositeelectrodewithhierarchicalstructureforsupercapacitors.Duringelectrochemicalcycling,thedissolutionofCuintoCuionswillcreatemoreactivesitesonNCA,andtheredepositedcopperoxidecanbecoatedontoNCH,givingrisetosubstantialincreaseinspecificcapacitancewithcycling.Meanwhile,NCAandNCHhaveexcellentconductivity,thusleadingtoexcellentrateperformance.Thisflexiblethin-filmelectrodedeliversanultrahighinitialspecificcapacitanceof0.63F·cm~(-2)(or781.3F·cm~(-3)).Duringcharge-dischargecycles,thespecificcapacitancecanincreaseupto1.18F·cm~(-2)(or1475F·cm~(-3))alongwiththe'self-etching'process.Theelectrodepresentsabetterspecificcapacitanceandratecapabilitycomparedwithpreviouslyreportedflexiblethin-filmelectrode,andthisnoveldesignofetchingtechniquemayexpandtootherbinaryorternarymaterials.