简介:ThediamondfilmsadherenttoSisubstratearedepositedwiththemicrowaveplasmaCVD(MPCVD)atmicrowavepowersof6000Wand4000Wfrom6hto10h,respectively,theinternalstressesofthefilmsaremeasuredbyXRD.Spectralpeakshiftandwideningareappliedtocalculatethemagnitudesofmacroandmicrostresses.Theresultsshowthatthemacrostressistensile.Theinternalstresscanbecontrolledbythemicrowavepower.Withthemicrowavepowerincreasing,theintrinsicandmacrostressesdecrease,andthemicrostressincreasessignificantly.Also,itcanbefoundthatthemacroandmicrostressesincreasewithdepositedtimewhentheotherconditionsarethesame.
简介:Singlecrystal(100)InPsamplesand(0001)GaNepitaxiallayerswereirradiatedattheHeavyIonResearchFacilityinLanzhou(HIRFL)with86Krionsatroomtemperature.Theionfluencewasvariedfrom5×1010to1×1012cm?2.Additionally,thinaluminumfoilswithdifferentthickness(sometensofmicrometers)wereplacedinfrontofsomesamplestodeceleratetheSHI's.Ionbeamscanningwasusedtoirradiatethewholesamplesurfaceinauniformwayandmaintainednormalincidence.Topreventsampleheatingduringhigh-energyirradiation,thefluxwaskeptconstantbelow1.3×1010cm?2s?1.ThemodificationsofthesampleswereinvestigatedbyXRD.
简介:三件kaolinite样品申请了纸涂层从美洲(KA)被收集,巴西(KB),和中国(KC)分别地。参数象Si-O和Al-O的平均契约长度那样(l(Si-O)和l(Al-O)),有四面的旋转角度(),有四面的变平的角度变化()并且八面的变平角度()对理想的角度比较,粒子层厚度(T)和基础z折皱(z)被XRD和Rietveld方法分析。试验性的结果显示了那zKA>zKC>zKB。KB有常规结构,KA有混乱结构,KA>KC>KB,KA>KC>KB,和KA>KB>KC。KA有不稳定的四面体和八面体。KB和KC分别地有稳定的四面体和八面体。在制造的过程,kaolinite结构可以与不稳定的四面体和八面体从地方被打破。l(Si-O)KA>l(Si-O)KB>l(Si-O)KC和l(Al-O)KA>l(Al-O)KC>l(Al-O)KB。仅仅考虑了的,是契约长度的效果,KA可以最容易在制造被打破。与KA和KB的契约长度相比,KB和KC的Si-O,和Al-O可以是容易分别地碎。TKA
简介:采用共沉淀法制备了不同Zn掺杂量的Li(Ni1/3Co1/3Mn1/3)1-xZnxO2(x=0-0.08)固溶体,通过X射线衍射(XRD)和光电子能谱(XPS)分析,研究了不同Zn掺杂量对Li(Ni1/3Co1/3Mn1/3)1-xZnxO2固溶体晶体结构和过渡金属表面化学状态的影响。实验结果表明:当Zn掺杂量x小于0.006时,固溶体材料具有稳定的层状结构;微量Zn的掺杂能够增强晶体材料的整体键能。