简介:AninitialstructuredesignofMMI1×8opticalpowersplittersisreported.ThewaveguidematerialisSi-basedSiO2Ge-dopedanddepositedbyPECVDmethod.Embeddedstripstructureisimpliedinthesectiondesign.ByusingBPM-CAD,afavorableresultisobtainedthatthisdevicehasasounduniformityandfairlylowloss.Meanwhile,simulationsofdesignswithcertainchangedparametersisalsoimplementedforabetterdesignconfiguration.
简介:ThestainlessFe-Mn-Sishapememoryalloy(SMA)coatingwaspreparedonthesurfaceofAISI304stainlesssteel.Theprincipalresidualstressmeasuredbythemechanicalhole-drillingmethodindicatesthattheFe-Mn-SiSMAcladdingspecimenpossessesalowerresidualstresscomparedwiththe304stainlesssteelcladdingspecimen.Themeanstressvaluesoftheformerandthelatteron10-mm-thicksubstrateare4.751MPaand7.399MPa,respectively.What’smore,theirdeformationvalueson2-mm-thicksubstrateareabout0°and15°,respectively.Meanwhile,thevariationtrendandthevalueoftheresidualstresssimulatedbytheANSYSfiniteelementsoftwareconsistwithexperimentalresults.TheX-raydiffraction(XRD)patternshowsε-martensiteexistsinFe-Mn-SiSMAcoating,whichverifiesthemechanismoflowresidualstress.That’stheγ→εmartensitephasetransformation,whichrelaxestheresidualstressofthespecimenandreducesitsdeformationinthelasercladdingprocessing.
简介:Anultrahighvacuumchemicalvapordeposition(UHV/CVD)systemisintroduced.SiGealloysandSiGe/Simultiplequantumwells(MQWs)havebeengrownbycold-wallUHV/CVDusingdisilane(Si2H6)andgermane(GeH4)asthereactantgasesonSi(100)substrates.ThegrowthrateandGecontentsinSiGealloysarestudiedatdifferenttemperatureanddifferentgasflow.ThegrowthrateofSiGealloyisdecreasedwiththeincreaseofGeH4flowathightemperature.X-raydiffractionmeasurementshowsthatSiGe/SiMQWshavegoodcrystallinity,sharpinterfaceanduniformity.Nodislocationisfoundintheobservationoftransmissionelectronmicroscopy(TEM)ofSiGe/SiMQWs.TheaveragedeviationofthethicknessandthefractionofGeinsingleSiGealloysampleare3.31%and2.01%,respectively.
简介:Au/Al_2O_3/Al金属/绝缘体/金属连接(MIMJ)和Au/SiO_2/Simetal/insulator/Si连接(MISJ)成功地被构造了。这些连接的轻排放被表面电浆子电磁声子(SPP)在表面粗糙下面调停。从MISJ的轻排放从MIMJ比那更一致、稳定。MISJ的轻力量比MIMJ的高是大约2份~3订单。MISJ的轻排放光谱特别被分析。在光谱,有一座主要山峰在610nm~6的波长定位了40nm,它主要由于有在Au/air和Au/SiO_2接口的表面粗糙的SPP的夫妇。在更短的波长区域位于光谱的一座弱山峰也被发现,它被doped-Si血浆摆动的直接放射引起。
简介:Afast-speedpulsedetectorbasedonn-typeSi-Schottkydiodemountedinthewaveguideisinvestigated.Therelationofthefast-speedpulsedetectorbetweenresponsetimeand3dBbandwidthisanalyzed.Byadoptingthetunablecircuit,thematchedbandwidthisachievedaswideaspossible.Experimentalresultsshowthatthepulseresponsetimeofthedetectorislessthan150pswithinrandomcarriersignal500MHzbandwidthrangebetween35GHzto39GHzviatuningcircuit.Thedetectorisveryeasytooperatebecauseitdoesnotneedbiascurrentorsynch-pulsesource.
简介:UnipolarresistiveswitchingbehaviorsoftheZnOandAl2O3/ZnOfilmsfabricatedonflexiblesubstratesbypulselaserdepositionwerestudiedinthispaper.Thefilmsweredepositedatroomtemperaturewithoutpost-annealingtreatmentduringtheprocess.XraydiffractionresultsindicatedthatZnOfilmhasadominantpeakat(002).ScanningelectronmicroscopyobservationshowedacolumnargrainstructureoftheZnOfilmtothesubstrate.ThebilayerdeviceofAl2O3/ZnOfilmshadstableresistiveswitchingbehaviorswithagoodenduranceperformanceofmorethan200cycles,highresistiveswitchingratioofover103atareadvoltageof0.1V,whichisbetterthanthatofthesingleoxidelayerdeviceofZnOfilm.Apossibleresistiveswitchingfilamentarymodewasdemonstratedinthispaper.TheconductionmechanismsofhighandlowresistancestatescanbeexplainedbyspacechargelimitedconductionandOhmic’sbehaviors.Theenduranceofthebilayer(BL)devicewasnotdegradeduponbendingcycles,whichindicatesthepotentialoftheflexibleresistiveswitchingrandomaccessmemoryapplications.
简介:在无锡新区,有这样一个公司,几个创始人,毕业于同一所大学,华东理工大学,在同一家研究所工作,无锡化工研究设计院,最终为了一个共同的目标和理想走到了一起,因为他们拥有着同一个梦想,创中国芯IC塑封料民族第一品牌,这个响亮的名字叫——"创达"。
简介:UsingdoublecrystalX-raysdiffraction(DCXRD)andatomicforcemicroscopy(AFM),theresultsofGexSi1-xgrownUHV/CVDfromSi2H6andSiH4areanalyzedandcompared.Adsorbatescanmigratetotheenergy-favoringpositionduetotheslowgrowthratefromSiH4.Inthiscase,aSibufferthatisolatestheeffectofsubstrateonepilayercouldnotbegrown,whichresultsinapitpenetratingintoepilayerandbuffer.TheFWHMis0.055°inDCXRDfromSiH4.Thepresenceofdiffractionfringesisanindicationofanexcellentcrystallinequality,TheroughnessofthesurfaceisimprovedifgrownbySi2H6:however,thecrystalqualityoftheGex2Si1-xmaterialbecameworsethanthatfromSiH4duetomuchlargergrowthratefromSi2H6.ThecontentofGeisobtainedfromDCXRD,whichindicatesthegrowthratefromSi2H6islargest,thenGeH4andthatfromSiH4isleast.