简介:采用HSiCl3—NH3—N2(稀释气体)体系在石英陶瓷基板上通过低压化学气相沉积(LPCVD)法沉积出了Si3N4涂层,研究了工艺条件对涂层沉积速率的影响。结果表明,在没有稀释气体的情况下,随着沉积温度升高,Si3N4涂层的沉积速率逐渐增加,在850℃附近达到最大值,随着反应温度的进一步升高,涂层沉积速率下降。当存在稀释气体时,在所选温度范围内随着沉积温度的升高,Si3N4涂层的沉积速率一直增大,反应的表观活化能约为222kJ/mol。随着原料中NH3/HSiCl3流量比值的增大,Si3N4涂层的沉积速率逐渐增加,随后稳定,但稍有下降趋势。在所选稀释气体流量范围内,Si3N4涂层的沉积速率随着稀释气体流量的增加而增大。
简介:目前中国市场上最便宜的720pDLP投影机廉价的高清投影机在一堆全高清投影机的包围下,奥图码在这个时候推出廉价的720p投影机是否有些不明智?
简介:LowcarbonsteelswithBandPadditionswereremeltedbyelectromagneticlevitationandsolidifiedinavacuumdroptube.Thedropletvolumesweresettobe2mm×2mm×2mm(TM)and5mm×5mm×5mm(FM),respectively.Themicrostructureofrapidlysolidifiedsteeldroplets(cooledinsiliconoil)withPandbothBandPadditionwasobserved.ThemicrostructuresofB-bearingdropletsamplesweremoreuniformthanthoseofB-freeones,forbothTMandFMsamples.Thedistributionof℃andPalongthediameterofeachsamplewasdetected.Thewell-distributionof℃andPwasdetectedinB-bearingdropletsamples.SoitcouldbededucedthatBwasalsowelldistributedinthesteels.ItwasBatomsthatpromotedthewell-distributionof℃andP,whichfurtherimprovedtheuniformityofmicrostructureundertheconditionofrapidsolidification.Themicro-hardnessofBbearingsampleswashigherthanthatofB-freesamples,andthehardeningmechanismwasdiscussedindetail.