Uniformity of TiN Films Fabricated by Hollow Cathode Discharge-中国期刊网

摘要 Titaniumnitride(TIN)filmsweredepositedonAISI304stainlesssteelsubstratesusinghollowcathodeplasmaphysicalvapordeposition(HC-PVD).TitaniumwasintroducedbyerodingtheTicathodenozzleandTiNwasformedinthepresenceofanitrogenplasmaexcitedbyradiofrequency(RF).Thesubstratebiasvoltagewasvariedfrom0to-300Vandtheuniformityinfilmthickness,surfaceroughness,crystalsize,microhardnessandwearresistanceforthefilmwithadiameterof20mmwasevaluated.Althoughthecentralzoneoftheplasmahadthehighestiondensity,thefilmthicknessdidnotvaryappreciablyacrossthesample.Theresultsfromatomicforcemicroscopy(AFM)revealedalowsurfaceroughnessdominatedbyanisland-likemorphologywithasimilarcrystalsizeontheentiresurface.Highermicrohardnesswasmeasuredatthecentralzoneofthesample.Thesampletreatedat-200Vhadexcellenttribologicalpropertiesanduniformity.

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Uniformity of TiN Films Fabricated by Hollow Cathode Discharge

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Uniformity of TiN Films Fabricated by Hollow Cathode Discharge

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