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2018年4期
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Effects of Surfactants SDS and CTAB on Ni-SiC Deposition
Effects of Surfactants SDS and CTAB on Ni-SiC Deposition
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摘要
未填写
DOI
g4q1e3vnd8/1866172
作者
KAN Hongmin;FENG Xiaojun;WEI Xiaodong;ZHANG Ning;WANG Xiaoyang;LONG Haibo
机构地区
不详
出处
《武汉理工大学学报:材料科学英文版》
2018年4期
关键词
表面活化剂
CTAB
SDS
原文
Ni
电气化学
分类
[一般工业技术][材料科学与工程]
出版日期
2018年04月14日(中国期刊网平台首次上网日期,不代表论文的发表时间)
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来源期刊
武汉理工大学学报:材料科学英文版
2018年4期
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相关关键词
表面活化剂
CTAB
SDS
原文
Ni
电气化学
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