摘要
Nitrogen-dopedamorphouscarbonthinfilmsaredepositedontheceramicsubstratescoatedwithTifilmbyusingdirectcurrentmagnetronsputteringtechniqueatN2andArgasmixtureatmosphereduringdeposition.Thefieldemissionpropertiesofthedepositedfilmshavebeeninvestigated.Thethresholdfieldaslowas5.93V/μmisobtainedandthemaximumcurrentdensityincreasesfrom4μA/cm2to20.67μA/cm2at10.67V/μmcomparingwithundopedamorphousfilm.Theresultsshowthatnitrogendopingplaysanimportantroleinfieldemissionofamorphouscarbonthinfilms.
出版日期
2002年04月14日(中国期刊网平台首次上网日期,不代表论文的发表时间)