简介:Thedual-frequencycapacitivelycoupledplasma(DF-CCP)withinductiveenhancementsystemisanewlydesignedplasmareactor.Differentfromtheconventionalinductivelycoupledplasma(ICP)reactors,nowaradiofrequency(rf)powerisconnectedtoanantennaplacedoutsidethechamberwithaone-turnbarecoilplacedbetweentwoelectrodesinDF-CCP.Thispapergivesadetaileddescriptionofitsstructure.Moreover,investigationsonsomecharacteristicsofdischargesinthisapparatusweremadeviaaLangmuirprobe.