学科分类
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161 个结果
  • 简介:AnomalousLeakageCurrentinSilicon0xynitrideThinFilmsGrownbyMicrowaveExcitedNitrogenPlasmaNitridation.Applicationoftheexplosivemethodforcreatingnitrogenlayers;Brightplasmanitridingofferriticsteelwithseveralalloyingelements;Cleaningasthemostimportantsteptowardssuccessfulheattreatment

  • 标签: 渗氮工艺 氧氮化硅 薄膜生长 微波激励等离子体氮化
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  • 简介:[篇名]ActivatedMigrationSintering,[篇名]Activationofsteelsurfacesbyoxynitriding,[篇名]Activescreenplasmanitridingtechnology,[篇名]AdvancedPlasmaNitridingforAluminumandAluminumAlloys,[篇名]Ananti-corrosionandwear-resistingcompoundingnitridedlayeronprecisepressedpartsofsoftsteels,[篇名]Anexperimentalstudytocorrelatewaterjetimpingementerosionresistanceandpropertiesofmetallicmaterialsandcoatings,[篇名]AnInfluenceofSonBombardingontheEffectsofNitridinginD.C.GlowDischargePlasma。

  • 标签: 渗氮 等离子体 磨损抗性 低碳钢 腐蚀防护
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  • 简介:CharacteristicsofsiliconoxynitridesmadebyECRplasmas;CharacterizationandcomparisonofPECVDsiliconnitrideandsiliconoxynitridedielectricforMIMcapacitors;CharacterizationofsiliconoxynitridethinfilmsdepositedbyECR-PECVD;Characterizationofsiliconoxynitridesandhigh-kdielectricmaterialsbyangle-resolvedX-rayphotoelectronspectroscopy

  • 标签: 氧氮共渗 氮氧化硅 ECR等离子体 薄膜沉降
  • 简介:[篇名]3-inchfull-colorOLEDdisplayusingaplasticsubstrate,[篇名]AsignificantimprovementinmemoryretentionofMFISstructurefor1T-typeferroelectricmemorybyrapidthermalannealing,[篇名]Accuratereliabilityevaluationofnon-uniformultrathinoxynitridcandhigh-klayers,[篇名]Advancedgatedielectricmaterialsforsub-100nmCMOS,[篇名]AINfilmscpitaxialyformedbydirectnitridationofsapphireusingaluminumoxynitridcasabufferlayer,[篇名]Amorphoussilicon-oxynitridcsubmicronfibres,[篇名]CharacteristicsofCr-Al-N-Othinfilmspreparedbypulsedlaserdeposition.

  • 标签: 氧氮共渗 腐蚀防护 塑性基 压电记忆材料 热退火处理
  • 简介:Characterisationandapplicationoftitaniumcarbonitride-basedcuttingtools;Compositeceramicsandcoatingsfortribotechnicalapplication;Crystallizationofpolymer-derivedsiliconcarbonitrideat1873Kundernitrogenoverpressure;1Effectofcoolingconditionsonplasma-carbonitridedironsurfaces

  • 标签: 碳氮共渗 钛合金 再结晶 温度控制
  • 简介:SY509-3-64[篇名]DegradationandSILCeffectsofRPECVDsub-2.0nmoxide/nitrideandoxynitridedielectricsunderconstantcurrentstress;SY509-3-65[篇名]EffectofMicrostructuralVariablesontheErosionofSiliconNitrideCeramics……

  • 标签: 氧氮共渗工艺 SILC 硅材料 恒流压力 等离子体
  • 简介:[篇名]Astudyonfrictionandwearbehaviourofcarburized,carbonitridedandboridedAISI1020and5115steels,[篇名]AlloyCarburizationatTemperaturesof1,200-2,100F(650-1,150℃),[篇名]Amorphoussiliconcarbonitridefibersdrawnfromalkoxidemodifiedceraser,[篇名]Bearingswithincrcasedreliability,[篇名]Brightoutlookforhardcoatings,[篇名]Carbonitridccoatingbylow-temperaturediffusionprocess,[篇名]Carbonitridcnanomaterials,thinfilms,andsolids.

  • 标签: 碳氮共渗 腐蚀防护 低温处理 磨损性质
  • 简介:以CO为还原剂,进行中试规模的TiO2氯化。在CO和Cl2存在的条件下,对半连续流化床反应器中的TiO2氯化过程进行实验分析和模拟。通过测量TiCl4生成量随时间的变化,连续监测氯化过程。系统研究氯化温度、原料粒径和粒度分布、原料量、Cl2和CO流速等操作参数对转化的影响。逐渐升高氯化温度导致转化单调上升。随着原料粒度的增大,转化降低,负载量的增加导致反应转化下降。提出一个预测反应过程中转化、粒径分布和气相组分摩尔分数的模型。在不同的操作条件下,模型预测的转化与实验数据吻合良好。

  • 标签: 氯化 TICL4 模拟 粒度分布 转化