简介:Inthiswork,thelaserinducedplasmaplumecharacteristicsandsurfacemorphologyofPt-andAg-iondepositedsiliconwerestudied.Thedepositedsiliconwasexposedtocumulativelaserpulses.Theplasmaplumeimagesproducedbyeachlasershotwerecapturedthroughacomputercontrolledimagecapturingsystemandanalyzedwithimage-Jsoftware.Theintegratedopticalemissionintensityofbothsamplesshowedanincreasingtrendwithincreasingpulses.Ag-iondepositedsiliconshowedhigheropticalemissionintensityascomparedtoPt-iondepositedsilicon,suggestingthatmoredamageoccurredtothesiliconbyAgions,whichwasconfirmedbySRIM/TRIMsimulations.Thesurfacemorphologiesofbothsampleswereexaminedbyopticalmicroscopeshowingthermal,exfoliationalandhydrodynamicalsputteringprocessesalongwiththere-depositionofthematerial,debrisandheataffectedzones’formation.ThecraterofPt-iondepositedsiliconwasdeeperbuthadlesslateraldamagethanAgiondepositedsilicon.Thenovelresultsclearlyindicatedthattheiondepositedsiliconsurfaceproducedincubationcenters,whichledtomoreabsorptionofincidentlightresultingintoahigheremissionintensityfromtheplasmaplumeanddeepercraterformationascomparedtopuresilicon.Theapproachcanbeeffectivelyutilizedinthelaserinducedbreakdownspectroscopytechnique,whichendurespoorlimitsofdetection.