Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature-中国期刊网

摘要 Siliconfilmsweregrownonaluminium-coatedglassbyinductivelycoupledplasmaCVDatroomtemperatureusingamixtureofSiH4andH2asthesourcegas.ThemicrostructureofthefilmswasevaluatedusingRamanspectroscopy,scanningelectronmicroscopyandatomicforcemicroscopy.Itwasfoundthatthefilmsarecomposedofcolumnargrainsandtheirsurfacesshowarandomanduniformdistributionofsiliconnanocones.Suchamicrostructureishighlyadvantageoustotheapplicationofthefilmsinsolarcellsandelectronemissiondevices.Fieldelectronemissionmeasurementofthefilmsdemonstratedthatthethresholdfieldstrengthisaslowas～9.8V/μmandtheelectronemissioncharacteristicisreproducible.Inaddition,amechanismissuggestedforthecolumnargrowthofcrystallinesiliconfilmsonaluminium-coatedglassatroomtemperature.

1ZHONGBo－qiang. Carrier Transport Properties in the Doped Micro—crystalline Silicon Films.物理电子学,1999-03.
2喻明浩;Yusuke TAKAHASHI;Hisashi KIHARA;Ken-ichi ABE;Kazuhiko YAMADA;Takashi ABE. Numerical Investigation of Flow Fields in Inductively Coupled Plasma Wind Tunnels.核技术及应用,2014-10.
3兰彦;尤庆亮;程诚;张素贞;倪国华;M. NAGATSU;孟月东. Graft Polymerization of Acrylic Acid on a Polytetrafluoroethylene Panel by an Inductively Coupled Plasma.核技术及应用,2011-01.
4毕振华;洪义;雷光玖;王帅;王友年;刘东平. Influence of a centered dielectric tube on inductively coupled plasma source： Chamber structures and plasma characteristics.物理,2017-07.
5Hideo Uchida;Hare Ram Aryal;Sudip Adhikari;Masayoshi Umeno. Low Temperature Plasma CVD Grown Graphene by Microwave Surface-Wave Plasma CVD Using Camphor Precursor.物理,2016-02.
6赵书霞;丰曌. Gas flow characteristics of argon inductively coupled plasma and advections of plasma species under incompressible and compressible flows.物理,2018-12.
7Xiao-lin Lu;Yong-li Mi. Glass Transition Behavior of Spin-coated Thin Films of a Hydrophilic Polymer on Supported Substrates.高分子化学,2015-04.
8RuoyuHong;JianminDing;HongzhongLi. THERMODYNAMIC ANALYSIS AND EXPERIMENTAL VERIFICATION FOR SYNTHESIZING SILICON NITRIDE NANOPARTICLES USING RF PLASMA CVD.力学,2003-04.
9. Study on the RF inductively coupled plasma spheroidization of refractory W and W-Ta alloy powders.核技术及应用,2018-01.
10程嘉;朱煜;季林红. Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design.核技术及应用,2012-12.

Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature

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Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature

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