摘要
Anewapproachisproposedtoaccuratelydeterminethethicknessoffilms,especiallyforultra-thinfilms,throughspectrum-fittingwiththeassistanceofaninterferencelayer.Thedeterminationlimitcanreachevenlessthan1nm.Itsaccuracyisfarbetterthanthatofthetraditionalmethods.Thisdeterminationmethodisverifiedbyexperiments,andthedeterminationlimitisatleast3.5nmcomparedwiththeresultsofatomicforcemicroscope(AFM).Furthermore,adoubleinterference-aidedspectrafittingmethodisproposedtoreducetherequirementsofthedeterminationinstruments,whichthusallowsonetodeterminethefilm’sthicknesswithalow-precisioncommonspectrometerandtogreatlylowerthecost.Itisaveryhigh-precisiondeterminationmethodforon-siteandin-situapplications,especiallyforultra-thinfilms.
出版日期
2016年08月18日（中国期刊网平台首次上网日期，不代表论文的发表时间）
